APA引文

Remashan, K., Chua, S., Ramam, A., Prakash, S., Liu, W., & ENGINEERING, E. (2014). Inductively coupled plasma etching of GaN using BCl3/Cl2 chemistry and photoluminescence studies of the etched samples.

Chicago Style Citation

Remashan, K., S.J Chua, A. Ramam, S. Prakash, W. Liu, and ELECTRICAL ENGINEERING. Inductively Coupled Plasma Etching of GaN Using BCl3/Cl2 Chemistry and Photoluminescence Studies of the Etched Samples. 2014.

MLA引文

Remashan, K., et al. Inductively Coupled Plasma Etching of GaN Using BCl3/Cl2 Chemistry and Photoluminescence Studies of the Etched Samples. 2014.

警告:這些引文格式不一定是100%准確.