APA引文

Ang, C., Lek, C., Tan, S., Cho, B., Chen, T., Lin, W., . . . ENGINEERING, E. (2014). Negative bias temperature instability on plasma-nitrided silicon dioxide film.

Chicago Style Citation

Ang, C.-H., C.-M Lek, S.-S Tan, B.-J Cho, T. Chen, W. Lin, J.-G Zhen, and ELECTRICAL ENGINEERING. Negative Bias Temperature Instability On Plasma-nitrided Silicon Dioxide Film. 2014.

MLA引文

Ang, C.-H., et al. Negative Bias Temperature Instability On Plasma-nitrided Silicon Dioxide Film. 2014.