Negative bias temperature instability on plasma-nitrided silicon dioxide film

Negative bias temperature instability on plasma-nitrided silicon dioxide film

Japanese Journal of Applied Physics, Part 2: Letters

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Bibliographic Details
Main Authors: Ang, C.-H., Lek, C.-M., Tan, S.-S., Cho, B.-J., Chen, T., Lin, W., Zhen, J.-G.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Interface trap
MOS
Negative-bias-temperature-instability
Thin oxide
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80781
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/80781

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