Negative bias temperature instability on plasma-nitrided silicon dioxide film

• Main Authors: Ang, C.-H., Lek, C.-M., Tan, S.-S., Cho, B.-J., Chen, T., Lin, W., Zhen, J.-G.
• 其他作者: ELECTRICAL ENGINEERING
• 格式: Article
• 出版: 2014
• 主題: Interface trap; MOS; Negative-bias-temperature-instability; Thin oxide
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/80781

Japanese Journal of Applied Physics, Part 2: Letters