Negative bias temperature instability on plasma-nitrided silicon dioxide film
Japanese Journal of Applied Physics, Part 2: Letters
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Main Authors: | , , , , , , |
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Other Authors: | |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/62459 |
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Institution: | National University of Singapore |