Negative bias temperature instability on plasma-nitrided silicon dioxide film

Japanese Journal of Applied Physics, Part 2: Letters

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Bibliographic Details
Main Authors:	Ang, C.-H., Lek, C.-M., Tan, S.-S., Cho, B.-J., Chen, T., Lin, W., Zhen, J.-G.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Interface trap MOS Negative-bias-temperature-instability Thin oxide
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/62459
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-62459
record_format	dspace
spelling	sg-nus-scholar.10635-624592015-02-03T21:14:03Z Negative bias temperature instability on plasma-nitrided silicon dioxide film Ang, C.-H. Lek, C.-M. Tan, S.-S. Cho, B.-J. Chen, T. Lin, W. Zhen, J.-G. ELECTRICAL ENGINEERING Interface trap MOS Negative-bias-temperature-instability Thin oxide Japanese Journal of Applied Physics, Part 2: Letters 41 3 B L314-L316 JAPLD 2014-06-17T06:51:16Z 2014-06-17T06:51:16Z 2002-03-15 Article Ang, C.-H.,Lek, C.-M.,Tan, S.-S.,Cho, B.-J.,Chen, T.,Lin, W.,Zhen, J.-G. (2002-03-15). Negative bias temperature instability on plasma-nitrided silicon dioxide film. Japanese Journal of Applied Physics, Part 2: Letters 41 (3 B) : L314-L316. ScholarBank@NUS Repository. 00214922 http://scholarbank.nus.edu.sg/handle/10635/62459 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
topic	Interface trap MOS Negative-bias-temperature-instability Thin oxide
spellingShingle	Interface trap MOS Negative-bias-temperature-instability Thin oxide Ang, C.-H. Lek, C.-M. Tan, S.-S. Cho, B.-J. Chen, T. Lin, W. Zhen, J.-G. Negative bias temperature instability on plasma-nitrided silicon dioxide film
description	Japanese Journal of Applied Physics, Part 2: Letters
author2	ELECTRICAL ENGINEERING
author_facet	ELECTRICAL ENGINEERING Ang, C.-H. Lek, C.-M. Tan, S.-S. Cho, B.-J. Chen, T. Lin, W. Zhen, J.-G.
format	Article
author	Ang, C.-H. Lek, C.-M. Tan, S.-S. Cho, B.-J. Chen, T. Lin, W. Zhen, J.-G.
author_sort	Ang, C.-H.
title	Negative bias temperature instability on plasma-nitrided silicon dioxide film
title_short	Negative bias temperature instability on plasma-nitrided silicon dioxide film
title_full	Negative bias temperature instability on plasma-nitrided silicon dioxide film
title_fullStr	Negative bias temperature instability on plasma-nitrided silicon dioxide film
title_full_unstemmed	Negative bias temperature instability on plasma-nitrided silicon dioxide film
title_sort	negative bias temperature instability on plasma-nitrided silicon dioxide film
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/62459
_version_	1681085779603881984

Negative bias temperature instability on plasma-nitrided silicon dioxide film

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