Impact of rapid thermal annealing temperature on non-metallised polycrystalline silicon thin-film diodes on glass

Impact of rapid thermal annealing temperature on non-metallised polycrystalline silicon thin-film diodes on glass

10.1016/j.tsf.2013.02.023

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Bibliographic Details
Main Authors: Hidayat, H., Kumar, A., Law, F., Ke, C., Widenborg, P.I., Aberle, A.G.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Doping concentration
Electrochemical capacitance voltage
Junction depth
Poly-crystalline silicon
Rapid thermal annealing
Sheet resistance
Thin-film solar cells
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82498
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/82498

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