Tian, F., Chor, E., & ENGINEERING, E. &. C. (2014). Improved electrical performance and thermal stability of HfO2 / Al2 O3 bilayer over HfO2 gate dielectric AlGaN/GaN MIS-HFETs.
Chicago Style CitationTian, F., E.F Chor, and ELECTRICAL & COMPUTER ENGINEERING. Improved Electrical Performance and Thermal Stability of HfO2 / Al2 O3 Bilayer Over HfO2 Gate Dielectric AlGaN/GaN MIS-HFETs. 2014.
MLA引文Tian, F., E.F Chor, and ELECTRICAL & COMPUTER ENGINEERING. Improved Electrical Performance and Thermal Stability of HfO2 / Al2 O3 Bilayer Over HfO2 Gate Dielectric AlGaN/GaN MIS-HFETs. 2014.
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