Ion implantation challenges for patterned media at areal densities over 5 tbpsi

Ion implantation challenges for patterned media at areal densities over 5 tbpsi

10.1109/TMAG.2013.2285938

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Bibliographic Details
Main Authors: Kundu, S., Gaur, N., Piramanayagam, S.N., Maurer, S.L., Yang, H., Bhatia, C.S.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Bit patterned media (BPM)
Ion implantation
Lateral straggle
Perpendicular magnetic recording
Online Access:http://scholarbank.nus.edu.sg/handle/10635/82585
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Institution: National University of Singapore
Description
Summary:10.1109/TMAG.2013.2285938

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