Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

10.1016/S0921-5107(01)00545-1

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Bibliographic Details
Main Authors:	Wang, Y., Gong, H., Zhu, F., Liu, L., Huang, L., Huan, A.C.H.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Article
Published:	2014
Subjects:	Cu-Al-O P-type PE-MOCVD Semiconducting Transparent
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/82827
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-82827
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spelling	sg-nus-scholar.10635-828272024-11-12T23:40:51Z Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition Wang, Y. Gong, H. Zhu, F. Liu, L. Huang, L. Huan, A.C.H. ELECTRICAL & COMPUTER ENGINEERING MATERIALS SCIENCE Cu-Al-O P-type PE-MOCVD Semiconducting Transparent 10.1016/S0921-5107(01)00545-1 Materials Science and Engineering B: Solid-State Materials for Advanced Technology 85 2-3 131-134 MSBTE 2014-10-07T04:33:58Z 2014-10-07T04:33:58Z 2001-08-22 Article Wang, Y., Gong, H., Zhu, F., Liu, L., Huang, L., Huan, A.C.H. (2001-08-22). Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition. Materials Science and Engineering B: Solid-State Materials for Advanced Technology 85 (2-3) : 131-134. ScholarBank@NUS Repository. https://doi.org/10.1016/S0921-5107(01)00545-1 09215107 http://scholarbank.nus.edu.sg/handle/10635/82827 000170247700011 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Cu-Al-O P-type PE-MOCVD Semiconducting Transparent
spellingShingle	Cu-Al-O P-type PE-MOCVD Semiconducting Transparent Wang, Y. Gong, H. Zhu, F. Liu, L. Huang, L. Huan, A.C.H. Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
description	10.1016/S0921-5107(01)00545-1
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Wang, Y. Gong, H. Zhu, F. Liu, L. Huang, L. Huan, A.C.H.
format	Article
author	Wang, Y. Gong, H. Zhu, F. Liu, L. Huang, L. Huan, A.C.H.
author_sort	Wang, Y.
title	Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
title_short	Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
title_full	Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
title_fullStr	Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
title_full_unstemmed	Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition
title_sort	optical and electrical properties of p-type transparent conducting cu-al-o thin films prepared by plasma enhanced chemical vapor deposition
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/82827
_version_	1821231849308946432

Optical and electrical properties of p-type transparent conducting Cu-Al-O thin films prepared by plasma enhanced chemical vapor deposition

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