APA引文

Choi, W., Lee, L., Foo, S., Gangadharan, S., Chong, N., Tan, L., & ENGINEERING, E. &. C. (2014). Oxidation study of plasma-enhanced chemical vapor deposited and rf sputtered hydrogenated amorphous silicon carbide films.

Chicago Style Citation

Choi, W.K., L.P Lee, S.L Foo, S. Gangadharan, N.B Chong, L.S Tan, and ELECTRICAL & COMPUTER ENGINEERING. Oxidation Study of Plasma-enhanced Chemical Vapor Deposited and Rf Sputtered Hydrogenated Amorphous Silicon Carbide Films. 2014.

MLA引文

Choi, W.K., et al. Oxidation Study of Plasma-enhanced Chemical Vapor Deposited and Rf Sputtered Hydrogenated Amorphous Silicon Carbide Films. 2014.