Wang, X., Li, M., Ren, C., Yu, X., Shen, C., Ma, H., . . . ENGINEERING, E. &. C. (2014). Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs.
Chicago Style CitationWang, X.P., et al. Tuning Effective Metal Gate Work Function By a Novel Gate Dielectric HfLaO for NMOSFETs. 2014.
MLA引文Wang, X.P., et al. Tuning Effective Metal Gate Work Function By a Novel Gate Dielectric HfLaO for NMOSFETs. 2014.
警告：這些引文格式不一定是100％准確.