Wang, X., Li, M., Ren, C., Yu, X., Shen, C., Ma, H., . . . ENGINEERING, E. &. C. (2014). Tuning effective metal gate work function by a novel gate dielectric HfLaO for nMOSFETs.
استشهاد بنمط شيكاغوWang, X.P., et al. Tuning Effective Metal Gate Work Function By a Novel Gate Dielectric HfLaO for NMOSFETs. 2014.
MLA استشهادWang, X.P., et al. Tuning Effective Metal Gate Work Function By a Novel Gate Dielectric HfLaO for NMOSFETs. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.