Text this

Number:

Provider:

CAPTCHA:

  ______    ______               ___              
 /_   _//  /_   _//   ____      / _ \\    ____    
   | ||     -| ||-   |    \\   | / \ ||  |    \\  
  _| ||     _| ||_   | [] ||   | \_/ ||  | [] ||  
 /__//     /_____//  |  __//    \___//   |  __//  
 `--`      `-----`   |_|`-`     `---`    |_|`-`   
                     `-`                 `-`

Please enter what you see:

Text this: Direct trim etching process of Si/SiO2 gate stacks using 193 nm ArF patterns