أرسل هذا في رسالة قصيرة: Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction

  ______    ______   ______    _    _    _    _   
 /_   _//  /_   _// |      \\ | || | || | |  | || 
   | ||     -| ||-  |  --  // | || | || | |/\| || 
  _| ||     _| ||_  |  --  \\ | \\_/ || |  /\  || 
 /__//     /_____// |______//  \____//  |_// \_|| 
 `--`      `-----`  `------`    `---`   `-`   `-`