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| \  / ||   / _ \\   / ____||  /_   _// | || | || 
|  \/  ||  / //\ \\ / //---`'   -| ||-  | || | || 
| .  . || |  ___  ||\ \\___     _| ||_  | \\_/ || 
|_|\/|_|| |_||  |_|| \_____||  /_____//  \____//  
`-`  `-`  `-`   `-`   `----`   `-----`    `---`

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Text this: Enhancement of TFET performance using Dopant Profile-Steepening Implant and source dopant concentration engineering at tunneling junction