Ion beam modification of exchange coupling to fabricate patterned media

10.1166/jnn.2011.2704

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Bibliographic Details
Main Authors:	Ranjbar, M., Piramanayagam, S.N., Sbiaa, R., Aung, K.O., Guo, Z.B., Chong, T.C.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Antiferromagnetically coupled media Focused ion beam Magnetic materials Nanofabrication Patterning
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83868
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Institution:	National University of Singapore

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