Chua, G., Tay, C., Quan, C., Lin, Q., & ENGINEERING, M. (2014). Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography.
Chicago Style CitationChua, G.S., C.J Tay, C. Quan, Q. Lin, and MECHANICAL ENGINEERING. Improvement of Rayleigh Criterion With Duty Ratio Characterization for Subwavelength Lithography. 2014.
MLA CitationChua, G.S., et al. Improvement of Rayleigh Criterion With Duty Ratio Characterization for Subwavelength Lithography. 2014.
Warning: These citations may not always be 100% accurate.