Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography

Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

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Bibliographic Details
Main Authors: Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85295
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/85295

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