Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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sg-nus-scholar.10635-852952024-11-13T04:24:14Z Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography Chua, G.S. Tay, C.J. Quan, C. Lin, Q. MECHANICAL ENGINEERING Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 2 801-808 JVTBD 2014-10-07T09:06:21Z 2014-10-07T09:06:21Z 2004-03 Article Chua, G.S.,Tay, C.J.,Quan, C.,Lin, Q. (2004-03). Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 (2) : 801-808. ScholarBank@NUS Repository. 10711023 http://scholarbank.nus.edu.sg/handle/10635/85295 NOT_IN_WOS Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Chua, G.S. Tay, C.J. Quan, C. Lin, Q. |
| format |
Article |
| author |
Chua, G.S. Tay, C.J. Quan, C. Lin, Q. |
| spellingShingle |
Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography |
| author_sort |
Chua, G.S. |
| title |
Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography |
| title_short |
Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography |
| title_full |
Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography |
| title_fullStr |
Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography |
| title_full_unstemmed |
Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography |
| title_sort |
improvement of rayleigh criterion with duty ratio characterization for subwavelength lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/85295 |
| _version_ |
1821203451881717760 |