Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Saved in:

Bibliographic Details
Main Authors:	Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85295
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

id	sg-nus-scholar.10635-85295
record_format	dspace
spelling	sg-nus-scholar.10635-852952015-02-03T01:20:35Z Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography Chua, G.S. Tay, C.J. Quan, C. Lin, Q. MECHANICAL ENGINEERING Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 2 801-808 JVTBD 2014-10-07T09:06:21Z 2014-10-07T09:06:21Z 2004-03 Article Chua, G.S.,Tay, C.J.,Quan, C.,Lin, Q. (2004-03). Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography. Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 22 (2) : 801-808. ScholarBank@NUS Repository. 10711023 http://scholarbank.nus.edu.sg/handle/10635/85295 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
description	Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Chua, G.S. Tay, C.J. Quan, C. Lin, Q.
format	Article
author	Chua, G.S. Tay, C.J. Quan, C. Lin, Q.
spellingShingle	Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
author_sort	Chua, G.S.
title	Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
title_short	Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
title_full	Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
title_fullStr	Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
title_full_unstemmed	Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography
title_sort	improvement of rayleigh criterion with duty ratio characterization for subwavelength lithography
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/85295
_version_	1681089774965751808

Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography

Similar Items