Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography

Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Saved in:
Bibliographic Details
Main Authors: Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85295
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Similar Items