Modified Rayleigh criterion for 90 nm lithography technologies and below

• Main Authors: Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
• Other Authors: MECHANICAL ENGINEERING
• Format: Article
• Published: 2014
• Subjects: Depth of focus; Diffraction orders; Dipole illumination; Forbidden pitch; Fraunhofer diffraction; Low k1 imaging; Off-axis illumination; Rayleigh's equations
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/85430
• Institution: National University of Singapore

10.1016/j.mee.2003.10.003