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  _  _     _____     ____       ___      _  _   
 | \| ||  |  ___||  |  _ \\    / _ \\   | \| || 
 |  ' ||  | ||__    | |_| ||  / //\ \\  |  ' || 
 | .  ||  | ||__    | .  //  |  ___  || | .  || 
 |_|\_||  |_____||  |_|\_\\  |_||  |_|| |_|\_|| 
 `-` -`   `-----`   `-` --`  `-`   `-`  `-` -`

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Text this: Modified Rayleigh criterion for 90 nm lithography technologies and below