Modified Rayleigh criterion for 90 nm lithography technologies and below

10.1016/j.mee.2003.10.003

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Bibliographic Details
Main Authors:	Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
Other Authors:	MECHANICAL ENGINEERING
Format:	Article
Published:	2014
Subjects:	Depth of focus Diffraction orders Dipole illumination Forbidden pitch Fraunhofer diffraction Low k1 imaging Off-axis illumination Rayleigh's equations
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/85430
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-85430
record_format	dspace
spelling	sg-nus-scholar.10635-854302024-11-13T04:24:09Z Modified Rayleigh criterion for 90 nm lithography technologies and below Chua, G.S. Tay, C.J. Quan, C. Lin, Q. MECHANICAL ENGINEERING Depth of focus Diffraction orders Dipole illumination Forbidden pitch Fraunhofer diffraction Low k1 imaging Off-axis illumination Rayleigh's equations 10.1016/j.mee.2003.10.003 Microelectronic Engineering 71 2 139-149 MIENE 2014-10-07T09:07:55Z 2014-10-07T09:07:55Z 2004-02 Article Chua, G.S., Tay, C.J., Quan, C., Lin, Q. (2004-02). Modified Rayleigh criterion for 90 nm lithography technologies and below. Microelectronic Engineering 71 (2) : 139-149. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2003.10.003 01679317 http://scholarbank.nus.edu.sg/handle/10635/85430 000188297000004 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Depth of focus Diffraction orders Dipole illumination Forbidden pitch Fraunhofer diffraction Low k1 imaging Off-axis illumination Rayleigh's equations
spellingShingle	Depth of focus Diffraction orders Dipole illumination Forbidden pitch Fraunhofer diffraction Low k1 imaging Off-axis illumination Rayleigh's equations Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Modified Rayleigh criterion for 90 nm lithography technologies and below
description	10.1016/j.mee.2003.10.003
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Chua, G.S. Tay, C.J. Quan, C. Lin, Q.
format	Article
author	Chua, G.S. Tay, C.J. Quan, C. Lin, Q.
author_sort	Chua, G.S.
title	Modified Rayleigh criterion for 90 nm lithography technologies and below
title_short	Modified Rayleigh criterion for 90 nm lithography technologies and below
title_full	Modified Rayleigh criterion for 90 nm lithography technologies and below
title_fullStr	Modified Rayleigh criterion for 90 nm lithography technologies and below
title_full_unstemmed	Modified Rayleigh criterion for 90 nm lithography technologies and below
title_sort	modified rayleigh criterion for 90 nm lithography technologies and below
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/85430
_version_	1821199241889972224

Modified Rayleigh criterion for 90 nm lithography technologies and below

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