APA引文

Chua, G., Tay, C., Quan, C., Lin, Q., & ENGINEERING, M. (2014). Modified Rayleigh criterion for 90 nm lithography technologies and below.

Chicago Style Citation

Chua, G.S., C.J Tay, C. Quan, Q. Lin, and MECHANICAL ENGINEERING. Modified Rayleigh Criterion for 90 Nm Lithography Technologies and Below. 2014.

MLA引文

Chua, G.S., et al. Modified Rayleigh Criterion for 90 Nm Lithography Technologies and Below. 2014.