Modified Rayleigh criterion for 90 nm lithography technologies and below

• Main Authors: Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
• 其他作者: MECHANICAL ENGINEERING
• 格式: Article
• 出版: 2014
• 主題: Depth of focus; Diffraction orders; Dipole illumination; Forbidden pitch; Fraunhofer diffraction; Low k1 imaging; Off-axis illumination; Rayleigh's equations
• 在線閱讀: http://scholarbank.nus.edu.sg/handle/10635/85430

10.1016/j.mee.2003.10.003