Customized illumination shapes for 193nm immersion lithography

Customized illumination shapes for 193nm immersion lithography

10.1117/12.772441

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Bibliographic Details
Main Authors: Moh, L.L., Gek, S.C., Qunying, L., Cho, J.T., Chenggen, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Annular illumination
Dipole illumination
Forbidden pitch
Immersion lithography
Off axis illumination
Partial coherent imaging
Resolution enhancement
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73297
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/73297

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