Customized illumination shapes for 193nm immersion lithography

10.1117/12.772441

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Bibliographic Details
Main Authors:	Moh, L.L., Gek, S.C., Qunying, L., Cho, J.T., Chenggen, Q.
Other Authors:	MECHANICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Annular illumination Dipole illumination Forbidden pitch Immersion lithography Off axis illumination Partial coherent imaging Resolution enhancement
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/73297
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-73297
record_format	dspace
spelling	sg-nus-scholar.10635-732972023-10-30T21:42:35Z Customized illumination shapes for 193nm immersion lithography Moh, L.L. Gek, S.C. Qunying, L. Cho, J.T. Chenggen, Q. MECHANICAL ENGINEERING Annular illumination Dipole illumination Forbidden pitch Immersion lithography Off axis illumination Partial coherent imaging Resolution enhancement 10.1117/12.772441 Proceedings of SPIE - The International Society for Optical Engineering 6924 - PSISD 2014-06-19T05:33:28Z 2014-06-19T05:33:28Z 2008 Conference Paper Moh, L.L., Gek, S.C., Qunying, L., Cho, J.T., Chenggen, Q. (2008). Customized illumination shapes for 193nm immersion lithography. Proceedings of SPIE - The International Society for Optical Engineering 6924 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.772441 9780819471093 0277786X http://scholarbank.nus.edu.sg/handle/10635/73297 000256699100103 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Annular illumination Dipole illumination Forbidden pitch Immersion lithography Off axis illumination Partial coherent imaging Resolution enhancement
spellingShingle	Annular illumination Dipole illumination Forbidden pitch Immersion lithography Off axis illumination Partial coherent imaging Resolution enhancement Moh, L.L. Gek, S.C. Qunying, L. Cho, J.T. Chenggen, Q. Customized illumination shapes for 193nm immersion lithography
description	10.1117/12.772441
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING Moh, L.L. Gek, S.C. Qunying, L. Cho, J.T. Chenggen, Q.
format	Conference or Workshop Item
author	Moh, L.L. Gek, S.C. Qunying, L. Cho, J.T. Chenggen, Q.
author_sort	Moh, L.L.
title	Customized illumination shapes for 193nm immersion lithography
title_short	Customized illumination shapes for 193nm immersion lithography
title_full	Customized illumination shapes for 193nm immersion lithography
title_fullStr	Customized illumination shapes for 193nm immersion lithography
title_full_unstemmed	Customized illumination shapes for 193nm immersion lithography
title_sort	customized illumination shapes for 193nm immersion lithography
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/73297
_version_	1781783296128057344

Customized illumination shapes for 193nm immersion lithography

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