Customized illumination shapes for 193nm immersion lithography

• Main Authors: Moh, L.L., Gek, S.C., Qunying, L., Cho, J.T., Chenggen, Q.
• Other Authors: MECHANICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: Annular illumination; Dipole illumination; Forbidden pitch; Immersion lithography; Off axis illumination; Partial coherent imaging; Resolution enhancement
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/73297
• Institution: National University of Singapore

10.1117/12.772441