Customized illumination shapes for 193nm immersion lithography
10.1117/12.772441
Saved in:
Main Authors: | Moh, L.L., Gek, S.C., Qunying, L., Cho, J.T., Chenggen, Q. |
---|---|
Other Authors: | MECHANICAL ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/73297 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Modified Rayleigh criterion for 90 nm lithography technologies and below
by: Chua, G.S., et al.
Published: (2014) -
Resolution Enhancement Techniques (RET) for Immersion Lithography
by: LING MOH LUNG
Published: (2011) -
Line end shortening and corner rounding for novel off-axis illumination source shapes
by: Ling, M.L., et al.
Published: (2014) -
Dipole options for 90nm lithography technologies and below
by: Chua, G.S., et al.
Published: (2014) -
Illumination System Modeling Techniques in Wire Bonding Pattern Recognition System
by: Yong, Wayne, et al.
Published: (2021)