Circular apertures for contact hole patterning in 193nm immersion lithography

Circular apertures for contact hole patterning in 193nm immersion lithography

10.1117/12.851318

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Bibliographic Details
Main Authors: Tay, C.J., Quan, C., Ling, M.L., Lin, Q., Tan, S.K., Chua, G.S.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Circular aperture
Contact hole patterning
Diffraction
Immersion lithography
OPC target
Resolution enhancement techniques
Square aperture
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73250
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/73250

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