Circular apertures for contact hole patterning in 193nm immersion lithography
10.1117/12.851318
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
|
| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/73250 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | National University of Singapore |
| id |
sg-nus-scholar.10635-73250 |
|---|---|
| record_format |
dspace |
| spelling |
sg-nus-scholar.10635-732502023-09-21T20:40:16Z Circular apertures for contact hole patterning in 193nm immersion lithography Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Tan, S.K. Chua, G.S. MECHANICAL ENGINEERING Circular aperture Contact hole patterning Diffraction Immersion lithography OPC target Resolution enhancement techniques Square aperture 10.1117/12.851318 Proceedings of SPIE - The International Society for Optical Engineering 7522 - PSISD 2014-06-19T05:32:54Z 2014-06-19T05:32:54Z 2010 Conference Paper Tay, C.J., Quan, C., Ling, M.L., Lin, Q., Tan, S.K., Chua, G.S. (2010). Circular apertures for contact hole patterning in 193nm immersion lithography. Proceedings of SPIE - The International Society for Optical Engineering 7522 : -. ScholarBank@NUS Repository. https://doi.org/10.1117/12.851318 9780819479129 0277786X http://scholarbank.nus.edu.sg/handle/10635/73250 000285572800178 Scopus |
| institution |
National University of Singapore |
| building |
NUS Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NUS Library |
| collection |
ScholarBank@NUS |
| topic |
Circular aperture Contact hole patterning Diffraction Immersion lithography OPC target Resolution enhancement techniques Square aperture |
| spellingShingle |
Circular aperture Contact hole patterning Diffraction Immersion lithography OPC target Resolution enhancement techniques Square aperture Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Tan, S.K. Chua, G.S. Circular apertures for contact hole patterning in 193nm immersion lithography |
| description |
10.1117/12.851318 |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Tan, S.K. Chua, G.S. |
| format |
Conference or Workshop Item |
| author |
Tay, C.J. Quan, C. Ling, M.L. Lin, Q. Tan, S.K. Chua, G.S. |
| author_sort |
Tay, C.J. |
| title |
Circular apertures for contact hole patterning in 193nm immersion lithography |
| title_short |
Circular apertures for contact hole patterning in 193nm immersion lithography |
| title_full |
Circular apertures for contact hole patterning in 193nm immersion lithography |
| title_fullStr |
Circular apertures for contact hole patterning in 193nm immersion lithography |
| title_full_unstemmed |
Circular apertures for contact hole patterning in 193nm immersion lithography |
| title_sort |
circular apertures for contact hole patterning in 193nm immersion lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/73250 |
| _version_ |
1779169642294542336 |