Chua, G., Tay, C., Quan, C., Lin, Q., & ENGINEERING, M. (2014). Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography.
استشهاد بنمط شيكاغوChua, G.S., C.J Tay, C. Quan, Q. Lin, و MECHANICAL ENGINEERING. Improvement of Rayleigh Criterion With Duty Ratio Characterization for Subwavelength Lithography. 2014.
MLA استشهادChua, G.S., et al. Improvement of Rayleigh Criterion With Duty Ratio Characterization for Subwavelength Lithography. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.