Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation
10.1007/s00339-010-5918-3
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2014
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sg-nus-scholar.10635-853192023-10-30T08:31:45Z Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation Yan, F. Zhu, T.J. Lai, M.O. Lu, L. MECHANICAL ENGINEERING 10.1007/s00339-010-5918-3 Applied Physics A: Materials Science and Processing 101 4 651-654 APAMF 2014-10-07T09:06:37Z 2014-10-07T09:06:37Z 2010-12 Article Yan, F., Zhu, T.J., Lai, M.O., Lu, L. (2010-12). Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation. Applied Physics A: Materials Science and Processing 101 (4) : 651-654. ScholarBank@NUS Repository. https://doi.org/10.1007/s00339-010-5918-3 09478396 http://scholarbank.nus.edu.sg/handle/10635/85319 000285195300013 Scopus |
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National University of Singapore |
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Asia |
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Singapore Singapore |
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| description |
10.1007/s00339-010-5918-3 |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Yan, F. Zhu, T.J. Lai, M.O. Lu, L. |
| format |
Article |
| author |
Yan, F. Zhu, T.J. Lai, M.O. Lu, L. |
| spellingShingle |
Yan, F. Zhu, T.J. Lai, M.O. Lu, L. Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation |
| author_sort |
Yan, F. |
| title |
Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation |
| title_short |
Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation |
| title_full |
Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation |
| title_fullStr |
Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation |
| title_full_unstemmed |
Influence of oxygen pressure on the ferroelectric properties of BiFeO 3 thin films on LaNiO3/Si substrates via laser ablation |
| title_sort |
influence of oxygen pressure on the ferroelectric properties of bifeo 3 thin films on lanio3/si substrates via laser ablation |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/85319 |
| _version_ |
1781784645404196864 |