Chua, G., Tay, C., Quan, C., Lin, Q., & ENGINEERING, M. (2014). Modified Rayleigh criterion for 90 nm lithography technologies and below.

Chua, G.S., C.J Tay, C. Quan, Q. Lin, و MECHANICAL ENGINEERING. Modified Rayleigh Criterion for 90 Nm Lithography Technologies and Below. 2014.

Chua, G.S., et al. Modified Rayleigh Criterion for 90 Nm Lithography Technologies and Below. 2014.