أرسل هذا في رسالة قصيرة: Modified Rayleigh criterion for 90 nm lithography technologies and below

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|  __ \\   /_   _//  /_   _//   / _ \\  | || | || 
| |  \ ||   -| ||-   `-| |,-   | / \ || | || | || 
| |__/ ||   _| ||_     | ||    | \_/ || | \\_/ || 
|_____//   /_____//    |_||     \___//   \____//  
 -----`    `-----`     `-`'     `---`     `---`