Zhu, J., Yeap, K., Zeng, K., Lu, L., & ENGINEERING, M. (2014). Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices.
Chicago Style CitationZhu, J., K.B Yeap, K. Zeng, L. Lu, and MECHANICAL ENGINEERING. Nanomechanical Characterization of Sputtered RuO2 Thin Film On Silicon Substrate for Solid State Electronic Devices. 2014.
MLA引文Zhu, J., et al. Nanomechanical Characterization of Sputtered RuO2 Thin Film On Silicon Substrate for Solid State Electronic Devices. 2014.
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