Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices

10.1016/j.tsf.2010.10.014

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Bibliographic Details
Main Authors: Zhu, J., Yeap, K.B., Zeng, K., Lu, L.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85454
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Institution: National University of Singapore