Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices

Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices

10.1016/j.tsf.2010.10.014

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Bibliographic Details
Main Authors: Zhu, J., Yeap, K.B., Zeng, K., Lu, L.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Elastic modulus
Interfacial toughness
Nanoindentation
Ruthenium dioxide
Sputtering
Thin films
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85454
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Institution: National University of Singapore
id sg-nus-scholar.10635-85454
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spelling sg-nus-scholar.10635-854542023-10-29T21:37:42Z Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices Zhu, J. Yeap, K.B. Zeng, K. Lu, L. MECHANICAL ENGINEERING Elastic modulus Interfacial toughness Nanoindentation Ruthenium dioxide Sputtering Thin films 10.1016/j.tsf.2010.10.014 Thin Solid Films 519 6 1914-1922 THSFA 2014-10-07T09:08:12Z 2014-10-07T09:08:12Z 2011-01-03 Article Zhu, J., Yeap, K.B., Zeng, K., Lu, L. (2011-01-03). Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices. Thin Solid Films 519 (6) : 1914-1922. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2010.10.014 00406090 http://scholarbank.nus.edu.sg/handle/10635/85454 000287339000026 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Elastic modulus
Interfacial toughness
Nanoindentation
Ruthenium dioxide
Sputtering
Thin films
spellingShingle Elastic modulus
Interfacial toughness
Nanoindentation
Ruthenium dioxide
Sputtering
Thin films
Zhu, J.
Yeap, K.B.
Zeng, K.
Lu, L.
Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices
description 10.1016/j.tsf.2010.10.014
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Zhu, J.
Yeap, K.B.
Zeng, K.
Lu, L.
format Article
author Zhu, J.
Yeap, K.B.
Zeng, K.
Lu, L.
author_sort Zhu, J.
title Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices
title_short Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices
title_full Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices
title_fullStr Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices
title_full_unstemmed Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices
title_sort nanomechanical characterization of sputtered ruo2 thin film on silicon substrate for solid state electronic devices
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/85454
_version_ 1781784678481526784

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