Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices

Nanomechanical characterization of sputtered RuO2 thin film on silicon substrate for solid state electronic devices

10.1016/j.tsf.2010.10.014

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Bibliographic Details
Main Authors: Zhu, J., Yeap, K.B., Zeng, K., Lu, L.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Elastic modulus
Interfacial toughness
Nanoindentation
Ruthenium dioxide
Sputtering
Thin films
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85454
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Institution: National University of Singapore
Description
Summary:10.1016/j.tsf.2010.10.014

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