RF sputtered Bismuth ferrite thin films: Effect of annealing duration

RF sputtered Bismuth ferrite thin films: Effect of annealing duration

10.1142/S1793604708000447

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Bibliographic Details
Main Authors: Zheng, R.Y., Wang, J., Ramakrishna, S.
Other Authors: MATERIALS SCIENCE AND ENGINEERING
Format: Article
Published: 2014
Subjects:
annealing condition
BFO thin films
ferroelectricity
Online Access:http://scholarbank.nus.edu.sg/handle/10635/85605
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/85605

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