Some recent developments of polyhedral oligomeric silsesquioxane (POSS)-based polymeric materials
10.1039/c0jm02785e
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Main Authors: | Wang, F., Lu, X., He, C. |
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Other Authors: | MATERIALS SCIENCE AND ENGINEERING |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/86721 |
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Institution: | National University of Singapore |
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