Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization

Advanced Functional Materials

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Main Authors:	Fu, G.-D., Yuan, Z., Kang, E.-T., Neoh, K.-G., Lai, D.M., Huan, A.C.H.
Other Authors:	CHEMICAL & BIOMOLECULAR ENGINEERING
Format:	Article
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/89561
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-89561
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spelling	sg-nus-scholar.10635-895612023-08-23T09:28:32Z Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H. CHEMICAL & BIOMOLECULAR ENGINEERING Advanced Functional Materials 15 2 315-322 AFMDC 2014-10-09T06:55:11Z 2014-10-09T06:55:11Z 2005-02 Article Fu, G.-D., Yuan, Z., Kang, E.-T., Neoh, K.-G., Lai, D.M., Huan, A.C.H. (2005-02). Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization. Advanced Functional Materials 15 (2) : 315-322. ScholarBank@NUS Repository. 1616301X http://scholarbank.nus.edu.sg/handle/10635/89561 000227403100019 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	Advanced Functional Materials
author2	CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet	CHEMICAL & BIOMOLECULAR ENGINEERING Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H.
format	Article
author	Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H.
spellingShingle	Fu, G.-D. Yuan, Z. Kang, E.-T. Neoh, K.-G. Lai, D.M. Huan, A.C.H. Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
author_sort	Fu, G.-D.
title	Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
title_short	Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
title_full	Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
title_fullStr	Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
title_full_unstemmed	Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
title_sort	nanoporous ultra-low-dielectric-constant fluoropolymer films via selective uv decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/89561
_version_	1776259000845729792

Nanoporous ultra-low-dielectric-constant fluoropolymer films via selective UV decomposition of poly(pentafluorostyrene)-block-poly(methyl methacrylate) copolymers prepared using atom transfer radical polymerization

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