Alternative NH4F/HCl solution for ultraclean Si(001) surface
10.1116/1.1286201
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sg-nus-scholar.10635-930712023-10-31T07:35:53Z Alternative NH4F/HCl solution for ultraclean Si(001) surface Bok, T.H. Ye, J.H. Li, S.F.Y. CHEMISTRY 10.1116/1.1286201 Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 5 2542-2548 JVTAD 2014-10-16T08:20:02Z 2014-10-16T08:20:02Z 2000-09 Article Bok, T.H., Ye, J.H., Li, S.F.Y. (2000-09). Alternative NH4F/HCl solution for ultraclean Si(001) surface. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 18 (5) : 2542-2548. ScholarBank@NUS Repository. https://doi.org/10.1116/1.1286201 07342101 http://scholarbank.nus.edu.sg/handle/10635/93071 000089434800078 Scopus |
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CHEMISTRY Bok, T.H. Ye, J.H. Li, S.F.Y. |
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Bok, T.H. Ye, J.H. Li, S.F.Y. |
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Bok, T.H. Ye, J.H. Li, S.F.Y. Alternative NH4F/HCl solution for ultraclean Si(001) surface |
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Bok, T.H. |
title |
Alternative NH4F/HCl solution for ultraclean Si(001) surface |
title_short |
Alternative NH4F/HCl solution for ultraclean Si(001) surface |
title_full |
Alternative NH4F/HCl solution for ultraclean Si(001) surface |
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Alternative NH4F/HCl solution for ultraclean Si(001) surface |
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Alternative NH4F/HCl solution for ultraclean Si(001) surface |
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alternative nh4f/hcl solution for ultraclean si(001) surface |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/93071 |
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