APA引文

Soo, C., Bourdillon, A., Valiyaveettil, S., Huan, A., Wee, A., Fan, M., . . . PHYSICS. (2014). Improvement on lithography pattern profile by plasma treatment.

Chicago Style Citation

Soo, C.P., A.J Bourdillon, S. Valiyaveettil, A. Huan, A. Wee, M.H Fan, T.C Ang, L.H Chan, and PHYSICS. Improvement On Lithography Pattern Profile By Plasma Treatment. 2014.

MLA引文

Soo, C.P., et al. Improvement On Lithography Pattern Profile By Plasma Treatment. 2014.