Wang, S., Dong, Y., Feng, Y., Huan, A., & PHYSICS. (2014). Band engineering in the high-k dielectrics gate stacks.
Chicago Style CitationWang, S.J., Y.F Dong, Y.P Feng, A.C.H Huan, and PHYSICS. Band Engineering in the High-k Dielectrics Gate Stacks. 2014.
MLA CitationWang, S.J., et al. Band Engineering in the High-k Dielectrics Gate Stacks. 2014.
Warning: These citations may not always be 100% accurate.