Band engineering in the high-k dielectrics gate stacks

Band engineering in the high-k dielectrics gate stacks

10.1016/j.mee.2007.04.050

Saved in:
Bibliographic Details
Main Authors: Wang, S.J., Dong, Y.F., Feng, Y.P., Huan, A.C.H.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Band alignment
High-k gate stacks
Interface
Metal gate
Online Access:http://scholarbank.nus.edu.sg/handle/10635/95848
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/95848

Similar Items