Band engineering in the high-k dielectrics gate stacks
10.1016/j.mee.2007.04.050
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sg-nus-scholar.10635-958482024-11-09T10:15:02Z Band engineering in the high-k dielectrics gate stacks Wang, S.J. Dong, Y.F. Feng, Y.P. Huan, A.C.H. PHYSICS Band alignment High-k gate stacks Interface Metal gate 10.1016/j.mee.2007.04.050 Microelectronic Engineering 84 9-10 2332-2335 MIENE 2014-10-16T09:16:31Z 2014-10-16T09:16:31Z 2007-09 Article Wang, S.J., Dong, Y.F., Feng, Y.P., Huan, A.C.H. (2007-09). Band engineering in the high-k dielectrics gate stacks. Microelectronic Engineering 84 (9-10) : 2332-2335. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2007.04.050 01679317 http://scholarbank.nus.edu.sg/handle/10635/95848 000247378600115 Scopus |
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Band alignment High-k gate stacks Interface Metal gate |
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Band alignment High-k gate stacks Interface Metal gate Wang, S.J. Dong, Y.F. Feng, Y.P. Huan, A.C.H. Band engineering in the high-k dielectrics gate stacks |
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10.1016/j.mee.2007.04.050 |
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PHYSICS |
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PHYSICS Wang, S.J. Dong, Y.F. Feng, Y.P. Huan, A.C.H. |
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Wang, S.J. Dong, Y.F. Feng, Y.P. Huan, A.C.H. |
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Wang, S.J. |
title |
Band engineering in the high-k dielectrics gate stacks |
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Band engineering in the high-k dielectrics gate stacks |
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Band engineering in the high-k dielectrics gate stacks |
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Band engineering in the high-k dielectrics gate stacks |
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Band engineering in the high-k dielectrics gate stacks |
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band engineering in the high-k dielectrics gate stacks |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/95848 |
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