Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices

• Main Author: JOO MOON SIG
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Theses and Dissertations
• Language: English
• Published: 2010
• Subjects: high-K dielectric, metal gate, Hf-based, CMOS, gate dielectric, work function
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/15386
• Institution: National University of Singapore

Ph.D