Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices

Ph.D

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Bibliographic Details
Main Author:	JOO MOON SIG
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	high-K dielectric, metal gate, Hf-based, CMOS, gate dielectric, work function
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15386
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-15386
record_format	dspace
spelling	sg-nus-scholar.10635-153862015-02-20T10:49:58Z Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices JOO MOON SIG ELECTRICAL & COMPUTER ENGINEERING CHO BYUNG-JIN high-K dielectric, metal gate, Hf-based, CMOS, gate dielectric, work function Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:52:59Z 2010-04-08T10:52:59Z 2006-06-22 Thesis JOO MOON SIG (2006-06-22). Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15386 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	high-K dielectric, metal gate, Hf-based, CMOS, gate dielectric, work function
spellingShingle	high-K dielectric, metal gate, Hf-based, CMOS, gate dielectric, work function JOO MOON SIG Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING JOO MOON SIG
format	Theses and Dissertations
author	JOO MOON SIG
author_sort	JOO MOON SIG
title	Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
title_short	Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
title_full	Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
title_fullStr	Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
title_full_unstemmed	Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices
title_sort	hf-based high-k gate dielectric and metal gate stack for advanced cmos devices
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/15386
_version_	1681079186009096192

Hf-based high-K gate dielectric and metal gate stack for advanced CMOS devices

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